HW402-Polyurethane metallographic polishing pads/cloths Size can be customized

HW402-Polyurethane metallographic polishing pads/cloths Product features Polishing is done to remove fine scratches and grinding marks from the specimen, creating a bright, flawless mirror surface for more accurate observation. 1 It can be used with Honway’s monocrystalline and polycrystalline diamond polishing fluids/pastes, cerium oxide polishing fluid, aluminum oxide polishing fluid, etc. Combined with abrasive ≤1.5um, it is suitable for intermediate polishing. The polyurethane polishing pad series is a highly flat, porous synthetic material. The product features a smooth surface and consists of a polishing layer, an abrasive storage layer, and a protective layer. It is made from a special vertical microporous structure that grows on a polyurethane base material. The pressure between the workpiece and the polishing pad causes the vertical microporous structure to act as a pump that enables the fast flow of abrasives, providing an excellent surface polishing process. This vertical microporous structure enhances the carrying capacity of the polishing pad and extends its lifespan. We offer four kinds of products: non-adhesive polishing fabrics, adhesive backed polishing cloths, rubber backed magnetic polishing cloths, and rubber backed iron polishing cloths. Rubber backed polishing cloth is made of soft iron, if you need to order please contact customer service for price. Scope of Application It is suitable for polishing electrodes made of gold, silver, platinum, graphite; as well as for optical fibers, resin-cured bodies, flat polishing machines, resin crafts, crystal crafts, instruments, soft metals, optical glass, electronic semiconductors, precision optical lenses, gemstones, and metallographic sections. Product features outer diameter： Ф127mm(Ф5in).Ф200mm(Ф8in).Ф230mm(Ф9in).Ф250mm(Ф9.5in).Ф300mm(Ф12in).Ф350mm(Ф14in).Ф380mm(Ф15in).Ф500mm(Ф20in).Ф650mm(Ф26in)etc.Other sizes can be customized. 1. Product advantages Other brand products Honway Selection (Win) Honway product selection advantages Polishing fabric Double-sided adhesive layer Release paper layer   Only three-layer design Polishing fabric Functional adhesive layer Reinforcement layer Double-sided adhesive layer Release paper layer Not easy to wrinkle Strong water resistance Not easy to fall off High flatness 2. How to Choose ※如何選擇拋光墊尺寸 無背膠拋光墊 > 機台盤 背膠拋光墊 = 機台盤 背磁拋光墊 = 機台盤 3. Precaution For optimal flatness, avoid sticking any labels or similar items to the bottom of the disc to prevent affecting workpiece flatness. The contact surface between the polishing pad and the machine must remain flat, clean, and dry to avoid affecting the flatness of the workpiece. After use, carefully remove the pad, rinse with water, and let it air dry. Do not bend or damage the polishing pad. When installing or removing, do so carefully to avoid magnetic attraction pinching your hands. 4. Others